Our epi-wafers are produced in clean rooms in a newly built manufacturing facility, using recently purchased AIX 2800 G4 platform from Aixtron. This modern system with Laytec’s in-situ monitoring coupled with the most advanced measurement techniques ensures the highest quality of the products offered.
The system is equipped with 60 x 2; 12 x 2, 3, 4; 8 x 6 inch wafer configuration. It is fitted with a horizontal laminar flow reactor, which ensures precise heterojunctions and unrivalled control of the deposition rates at the monolayer level. This principle coupled with the multiple rotation of substrate carriers gurantees excellent deposition homogeneity regarding layer thickness, composition and doping.
Reliability is one of our core values. We test all products comprehensively using reflectometry, electron microscopy, X-ray diffraction, atomic force microscopy, photoluminescence, Hall effect method, SIMS (second ion mass spectroscopy), DIC (differential interference contrast) microscopy, EC-V profilometry, spectrophotometry and more to ensure quality and uniformity.